Nanotechnology 2

Ultratech a division of Veeco, USA

Atomic Layer Deposition Systems (ALD)

Atomic Layer Deposition Systems

Device node shrinking continues, with 10nm and 7nm node in production, and development taking place down to 3nm. Our atomic layer deposition tools give you ultimate precision and uniformity for coatings at even the finest nodes.

Fiji – Plasma Enhanced ALD for R&D
Advanced Capabilities for Advanced Research

Our Fiji® series is a modular, high-vacuum thermal ALD system that accommodates a wide range of deposition modes using a flexible architecture and multiple configurations of precursors and plasma gases. The Fiji G2 is a next-generation ALD system capable of performing thermal and plasma-enhanced deposition.

We have applied advanced computational fluid dynamics analyses to optimize the Fiji® reactor, heater, and trap geometry. The system’s intuitive interface makes it easy to monitor and change recipes and processes as needed.

Phoenix – Batch Production ALD

Production Capabilities

The Phoenix® system is engineered for high throughput and maximum uptime in any fabrication environment, from pilot production to industrial-grade manufacturing. Technologists and researchers rely on the Phoenix® for repeatable, highly accurate film deposition on flat and 3D substrates alike. And with support for up to six individual precursor lines, the Phoenix® delivers solid, liquid, or gaseous process chemistries depending on your thin film needs. A compact footprint and innovative design makes the Phoenix® the practical choice for those with batch production ALD requirements.

Savannah – Thermal ALD for R&D

Advanced Capabilities for Advanced Research

Veeco is the leading provider of atomic layer deposition (ALD) systems for research and industry worldwide, delivering comprehensive services and versatile, turnkey systems that are accessible, affordable and accurate to the atomic scale. Thin film deposition is our expertise. Our Savannah® Series of thin film deposition tools exemplifies these competencies.

Savannah® has become the preferred system for university researchers worldwide engaged in ALD and looking for an affordable yet robust platform. We have delivered hundreds of these systems in the past decade. Savannah®’s efficient use of precursors and power-saving features substantially reduces the cost of operating a thin film deposition system.


The LaserWriter pattern generator

The LaserWriter system by MICROTECH is designed for the definition of planar geometries and for surface diagnostics, in applications where maximum resolutions down to 0.7 µm are required. The system transforms a laser beam into a controlled writing tool for photolithographic mask fabrication or for direct in situ processing on planar substrates. Besides microlithographic applications, its optical apparatus and substrate motion management are also well suited for surface inspection or diagnostics. Hence, the same machine can be used first for producing a pattern and later for inspecting the results. The patterns are generated by accurately moving the target (mask or substrate) underneath a focused and scanning laser beam with proper wavelength. The performance and cost of the system are optimised for research and development or small/medium productions.


MICROTECH has developed a complete microlithographic process for cylindrical surfaces. Such a process is suited for the fabrication of thin film coils, line arrays or generic patterns on the side surface of a cylinder, through the following steps:

  • 1. Surface cleaning and polishing to optical quality
  • 2. Coating with metal or dielectric thin film
  • 3. Coating with resist
  • 4. Laser writing of the pattern
  • 5. Resist processing
  • 6. Wet etching
  • 7. Plating

Patterning resolution down to 5 micrometers can be achieved, including the plating process. Steps 3, 4 and 7 are very dependent on the special shape of the substrate and can be accomplished through specific equipement available from MICROTECH:

Resist deposition system. This special equipement allow the deposition of a thin and uniform resist layer on cylindrical surfaces. A resist thickness in the 1 to 5 micron range can be programmed. The substrate diameter can range between 1 and 100 mm.

Ecopia Corporation

◆ Super high temperature hall effect measurement system.

1) Features

– Super high temperature hall effect measurement system that is useful to flow gas into chamber with sample.

– Newly developed furnace that makes it possible to increase over 800℃ and use for measuring hall effect.

– Gas flow control system in order to flow various gas.

– Sample holder for high temperature. (keep the good contact on 800℃)

– High Temperature control system (DC power)

※ On condition of specific temperature with gas flow , new semiconductor materials have been developed to see electrical property’s change.

2) Application

i) Fuel cell (Polymer, electrolyte ceramics)

ii) Gas sensor (flammable organic solvent)

iii) Optical electrode and optical sensor (production and storage of hydrogen)

iv) Semiconductor for thermoelectric element.

Semco Technologies

Workhorse solution for a wide range of RTP/RTA applications with premium features and capabilities

Jipelec JETFIRST systems are compact and robust halogen lamp heated rapid thermal processing systems specifically designed to meet the requirements of research and small-scale production units with substrate size ranging from pieces of sample to 300-mm diameter. The JETFIRST benchtop design allows a quick and easy installation in the lab facilities. Its user-friendly operating interface is clearly structured and ensures for starting and using of the system in a few hours.


Single-wafer RTP furnace for process engineering and qualification

Cold-wall metal chamber design

High-performance crossed lamp technology

Atmospheric or vacuum thermal treatment

Gas introduction capability (any precursor).


Rapid Thermal Annealing (RTA) and Contact alloying

Rapid Thermal Oxidation (RTO), deoxidation, and nitridation (RTN)

Rapid Thermal Diffusion (RTD) – e.g. Spin-on Dopant

Sulfurization, selenization and crystallization

Structural and mechanical stress relaxation

Printed metal contact firing.

SIOS Meßtechnik GmbH

Precision in Measurement

True to our motto Precision in Measurement, we develop and manufacture laser interferometric and other precision measuring devices for calibration and nano measurement technology for measuring length, angle, vibration, straightness, mass, force and other measured variables with the highest resolution and low measurement uncertainty.

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Winner Particle Instrument Stock Co. Ltd.

Laser Diffraction Particle Size Analyzer Principle

Laser Diffraction, also known as Static Light Scattering, has become one of the most widely used particle sizing distribution techniques across various industries. Samples can be analyzed on either a liquid suspension or dry dispersion basis. The sample material is passed through a laser beam which results in the laser light scattered at a wide range of angles. Detectors placed at fixed angles measure the intensity of light scattered at that position. A mathematical model (Mie or Fraunhoffer Theory) is then applied to generate a particle size distribution. The final result is reported on an Equivalent Spherical Diameter Volume basis.

Particle Size by Laser Diffraction is widely recognized by numerous standards and guidance agencies such as the ISO13320-1:1999,GB/T19077.1-2008,Q/0100JWN001-2013 This technique’s ability to perform dry or liquid dispersion analyses make it a good choice for general particle sizing applications and its broad dynamic range (sub-micron to millimeters) has proven useful to the environmental, pharmaceutical, food, health, beauty,petrochemical, mineral, metal and many other industries.

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Sciencetech Inc.


Sciencetech Light Sources

Sciencetech offers light sources from UV to Infrared. A complete light source typically includes the lamp mounted in a housing with condensing/coupling optics, a power supply and all the necessary cables and hardware. For spectroscopic application, a DC stabilized power supply is required. Arc sources also include a stand alone igniter to break down the gas and establish the plasma discharge. A full line of accessories such as light condensers and collimators, filters, optical feedback units output stabilization and light shutters are available.

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Copper Welding of Solar Thermal Heaters

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Laser Scribbing of Thin Films

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